Epson Digital Couture at NYFW

Epson Digital Couture Returns to New York Fashion Week

Epson Digital Couture at NYFW

Lenerd by Felipe Santamaria Luque of Colombia

Epson returned to New York Fashion Week to showcase their new digital textile printing expertise. The electronics company kicked off NYFW by hosting a Digital Couture presentation in the Meatpacking District highlighting looks created by 11 designers using their high-tech direct-to-garment and digital dye-sublimation printer. The digital dye-sublimation and direct-to-garment technology allows designers to manipulate textile designs and color selections with a simple click of a mouse. Epson’s SureColor® F-Series printers allow both young designers starting out in the fashion world and well-known brands the opportunity to do test runs and produce samples in-house making it an effective and cost-efficient method. This year’s theme was “Harmony and Peace Through Fashion” created by designers from the Americas including Cristina Ruales from Brooklyn, N.Y., Chloe Trujillo from Los Angeles, California, Santika by Danny Santiago from Miami, Florida, and Ossira by Agostina Orlandi and Ludmila Osikovsky from Argentina.

Photo: Courtesy BFANyc

Santika by Danny Santiago

Santika by Danny Santiago of Miami, FL

Epson Digital Couture

Pioneer by Janet Rios & Carmen Artica, of Peru

Epson Digital Couture

Chloe Trujillo, Los Angeles, CA

Epson Digital Couture

Matias Hernan of Chile

 

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